Effect study of precursor concentration of ZnO crystals obtained by electrode position

ZnO thin films were deposited on either indium tin oxide-coated glass by the electrodeposition process, using zinc chloride as precursor and continuous flowing air as precursors. The effect of concentration variation on the structural and morphological of ZnO films was studied and the optimum deposition conditions have been outlined. The kinetics of the growth of the films have been also investigated. The structure of the films was studied using X-ray diffractometry (XRD). The surface morphology and thickness of the films were determined using scanning electron microscopy. The X-ray diffraction analysis shows that the films are crystalline with hexagonal crystal structure (wurtzaite). The optical transmittance of ZnO decreases with the film thickness. The optical energy bandgap is around 3.29 eV.