DocumentCode :
376905
Title :
Quality factor improvement of on-chip inductors for HIPERLAN RFIC by micromachining
Author :
Chiu, Hong-Wei ; Chen, Hsiao-Chin ; Lu, Shey-Shi
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
2
fYear :
2001
fDate :
3-6 Dec. 2001
Firstpage :
859
Abstract :
The enhancement of quality factor of on-chip inductors by micromachining for HIPERLAN application is presented. A process for the selective removal of the substrate underneath the on-chip inductors is also developed. The fabrication steps consist of anisotropic wet etching of the semiconductor substrate under the inductors followed by laser stripping of passivation layers to expose the pads for IC testing. Experimental results show that the quality factors of the micromachined inductors can be increased by up to 50% around 5 GHz, which is suitable for HIPERLAN applications.
Keywords :
CMOS integrated circuits; Q-factor; etching; field effect MMIC; inductors; integrated circuit testing; laser beam machining; micromachining; 0.35 micron; 5 GHz; HIPERLAN RFIC; IC testing; RF CMOS technology; anisotropic wet etching; laser stripping; laser trimming; micromachined inductors; micromachining; on-chip inductors; passivation layers; quality factor improvement; selective substrate removal; semiconductor substrate; Anisotropic magnetoresistance; Inductors; Micromachining; Optical device fabrication; Passivation; Q factor; Radiofrequency integrated circuits; Semiconductor lasers; Substrates; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2001. APMC 2001. 2001 Asia-Pacific
Conference_Location :
Taipei, Taiwan
Print_ISBN :
0-7803-7138-0
Type :
conf
DOI :
10.1109/APMC.2001.985505
Filename :
985505
Link To Document :
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