DocumentCode
3769787
Title
Study and reduction of variability in 28 nm FDSOI technology
Author
Gilles Jacquemod;Zhaopeng Wei;Jad Modad;Yves Leduc;Philippe Lorenzini;Frederic Hameau;Emeric De Foucauld
Author_Institution
Nice Sophia Antipolis University, EpOC, URE UNS 006, Biot, France
fYear
2015
Firstpage
19
Lastpage
22
Abstract
This In this paper, we present a new inverter topology in order to decrease the process variability influence on performances of a ring oscillator. Using FDSOI technology, we used the back-gate electrode of the transistor to symmetrize the output of a complementary inverter. This technique will reduce the variability of the inverter and the jitter (i.e. the phase noise) of the ring oscillator. Complementary cells allow us to implement back-gate auto-biasing feedback without adding transistors and to realize a quadrature ring oscillator with an even number of inverters.
Keywords
"Inverters","Topology","Ring oscillators","Transistors","Standards","CMOS integrated circuits","Logic gates"
Publisher
ieee
Conference_Titel
CMOS Variability (VARI), 2015 International Workshop on
Type
conf
DOI
10.1109/VARI.2015.7456557
Filename
7456557
Link To Document