DocumentCode
3770470
Title
Photosensitive dry film solder mask
Author
Roger N. Brummel;Lyle R. Wallig
Author_Institution
DuPont Company, Riston®
fYear
1975
Firstpage
15
Lastpage
18
Abstract
The new photopolymer solder mask described here combines the properties of photographic selectivity, mechanical strength, and ease of reproducible application. It provides improved circuit protection during soldering operations and subsequent handling. The new solder mask offers substantial cost and performance advantages over screened masks to designers, printed wiring board fabricators, component assemblers, and end users.
Keywords
"Films","Resists","Soldering","Wiring","Conductors","Lamination","Surface treatment"
Publisher
ieee
Conference_Titel
Electrical/Electronics Insulation Conference, 1975 EIC 12th
Print_ISBN
978-1-5090-3111-5
Type
conf
DOI
10.1109/EIC.1975.7458480
Filename
7458480
Link To Document