DocumentCode :
3770924
Title :
Ultra Low-Voltage static precharge NAND/NOR gates
Author :
O. Mirmotahari;Y. Berg
Author_Institution :
Nanoelectronics, Department of Informatics, University of Oslo, Blindern, Norway
fYear :
2014
fDate :
7/1/2014 12:00:00 AM
Firstpage :
1
Lastpage :
5
Abstract :
The Ultra Low-Voltage (ULV) NAND and NOR gates are presented in this paper. These gates are based on the ULV precharge inverter presented in [11]. We intend to verify the gates´ logical expression of NAND and NOR. The inbound precharge logical behaviours of the gate have been previously discussed, and therefore we aim to compare these new NAND and NOR designs to traditional Domino and CMOS logic styles. This paper focuses on the aspect of delay. All results are obtained by simulation in Cadence for a 90 nm TSMC fabrication process.
Keywords :
"Logic gates","Transistors","Delays","CMOS integrated circuits","Parasitic capacitance","Simulation"
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2014 IEEE International
Electronic_ISBN :
2159-3531
Type :
conf
DOI :
10.1109/INEC.2014.7460450
Filename :
7460450
Link To Document :
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