• DocumentCode
    3773020
  • Title

    Development of power semiconductor silicon carbide technology - a breakthrough and epoch-making steps

  • Author

    Hiroyuki Matsunami

  • Author_Institution
    Kyoto University, 1-9 Nishiyama Adachi, Yawata, 614-8351, Japan
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    11
  • Lastpage
    14
  • Abstract
    In this paper, the expectation for SiC power devices was described, followed by historical aspects. A breakthrough in epitaxial growth has brought SiC as the most attractive material for power devices. Present device technologies were introduced. Epoch-making steps done by the author´s group were pointed out for SBDs and MOSFETs. The progress of SiC unipolar (majority carrier) devices with blocking voltage below 3.3 kV rating were shown. Some practical applications showing effective use of electric energy were demonstrated. Bipolar (minority carrier) devices, which may take the position above several kV ranges utilizing conductivity modulation, just started for the development.
  • Keywords
    "Silicon carbide","Silicon","MOSFET","Epitaxial growth","Crystals","Epitaxial layers","Junctions"
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology (IWJT), 2015 15th International Workshop on
  • Type

    conf

  • DOI
    10.1109/IWJT.2015.7467064
  • Filename
    7467064