DocumentCode :
3773020
Title :
Development of power semiconductor silicon carbide technology - a breakthrough and epoch-making steps
Author :
Hiroyuki Matsunami
Author_Institution :
Kyoto University, 1-9 Nishiyama Adachi, Yawata, 614-8351, Japan
fYear :
2015
fDate :
6/1/2015 12:00:00 AM
Firstpage :
11
Lastpage :
14
Abstract :
In this paper, the expectation for SiC power devices was described, followed by historical aspects. A breakthrough in epitaxial growth has brought SiC as the most attractive material for power devices. Present device technologies were introduced. Epoch-making steps done by the author´s group were pointed out for SBDs and MOSFETs. The progress of SiC unipolar (majority carrier) devices with blocking voltage below 3.3 kV rating were shown. Some practical applications showing effective use of electric energy were demonstrated. Bipolar (minority carrier) devices, which may take the position above several kV ranges utilizing conductivity modulation, just started for the development.
Keywords :
"Silicon carbide","Silicon","MOSFET","Epitaxial growth","Crystals","Epitaxial layers","Junctions"
Publisher :
ieee
Conference_Titel :
Junction Technology (IWJT), 2015 15th International Workshop on
Type :
conf
DOI :
10.1109/IWJT.2015.7467064
Filename :
7467064
Link To Document :
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