Electron-induced surface chemistry on TiN in ultrahigh vacuum

Author

Ma, Qing ; Rosenberg, Richard A.

Author_Institution

Argonne Nat. Lab., IL, USA

Volume

3

fYear

2001

fDate

2001

Firstpage

2147

Abstract

The property of the TiN/vacuum interface in ultrahigh vacuum and under electron beam irradiation is studied using Auger electron spectroscopy. About one monolayer of oxygen adsorbs on the surface and metal oxidation occurs. The characteristic of oxygen adsorption is discussed. Under electron irradiation with energies ranging from 1 keV to 9 keV, carbon accumulates on the surface, in addition to oxygen adsorption, which modifies the surface chemistry to an extent that depends on the vacuum conditions, electron current density and electron beam energy. High-energy electrons induce TiC formation

Keywords

Auger electron spectra; adsorbed layers; carbon; chemisorbed layers; electron beam effects; electron-surface impact; oxidation; titanium compounds; 1 to 9 keV; Auger electron spectroscopy; C; O; TiC formation; TiN; TiN/vacuum interface; carbon surface accumulation; electron beam energy; electron beam irradiation; electron current density; electron-induced surface chemistry; metal oxidation; oxygen adsorption; ultrahigh vacuum; vacuum condition effects; Chemistry; Electron beams; Energy measurement; Oxidation; Pollution measurement; Spectroscopy; Sputtering; Surface cleaning; Surface contamination; Tin;

fLanguage

English

Publisher

ieee

Conference_Titel

Particle Accelerator Conference, 2001. PAC 2001. Proceedings of the 2001

Conference_Location

Chicago, IL

Print_ISBN

0-7803-7191-7

Type

conf

DOI

10.1109/PAC.2001.987305

Filename

987305