Title :
Response to comments to "A distributive-transconductance model for border traps in III-V/High-k MOS capacitors"
Author :
Chen Zhang ; Min Xu ; Ye, Peide D. ; Xiuling Li
Author_Institution :
Electr. & Comput. Eng. Dept., Univ. of Illinois, Urbana, IL, USA
Abstract :
Summary form only given. We would like to thank Professor Taur and his colleagues for pointing out that the variation of an additional factor, emission probability (en), affects the charging current associated with border traps. While the new derivation shown in their comments is complete, we believe that the transconductance model of the above-named article [ibid., vol. 34, no. 6, pp. 735-737, Jun. 2013] does not introduce significant numerical error when applied to interpret the C-V data (1 kHz-1 MHz) measured from the high-k/GaAs MOS systems discussed in the original article. The original authors present a model to show that in spite of the missing factor in transconductance model, the model does not introduce significant errors within the parameter range discussed in the original work so the conclusions about the GaAs MOS capacitors in the original article should still be considered valid.
Keywords :
III-V semiconductors; MOS capacitors; gallium arsenide; semiconductor device models; C-V data; GaAs; III-V/high-k MOS capacitors; border traps; charging current; distributive-transconductance model; emission probability; frequency 1 kHz to 1 MHz; high-k/GaAs MOS systems; Capacitance; Electron traps; High K dielectric materials; MOS capacitors; Numerical models; Semiconductor device modeling; Transconductance;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2013.2282234