Title :
Extreme ultraviolet (EUV) sources based on synchrotron radiation
Author :
Hesch, Klaus ; Pellegrin, Eric ; Rossmanith, Robert ; Steininger, Ralph ; Saile, Volker ; Wüst, Jürgen ; Dattoli, Guiseppe ; Doria, Andrea ; Gallerano, Gian Piero ; Giannessi, Luca ; Ottaviani, Pier Luigi ; Moser, Herbert O.
Author_Institution :
Forschungszentrum Karlsruhe GmbH, Germany
Abstract :
The production of extreme ultraviolet radiation (13.5 nm or 11.3 nm wavelength) by relativistic electrons as a source for the Next Generation Lithography (NGL) based on the EUV-concept (13.5 nm or 11.3 nm wavelength) is discussed. The requirements of the lithography community are as follows: output power of 50 to 150 W within 2 % bandwidth and a maximum of 500 W outside this bandwidth. It is shown that among all other synchrotron radiation devices only a free electron laser (minimum beam energy 500 MeV) can (under certain circumstances) fulfil these requirements
Keywords :
electron accelerators; free electron lasers; light sources; relativistic electron beams; storage rings; ultraviolet lithography; 11.3 nm; 13.5 nm; 50 to 150 W; 500 MeV; 500 W; EUV sources; FEL; Next Generation Lithography; extreme ultraviolet sources; free electron laser; relativistic electrons; storage rings; synchrotron radiation; Bandwidth; Free electron lasers; Lithography; Power generation; Semiconductor lasers; Storage rings; Synchrotron radiation; Ultraviolet sources; Undulators; X-ray lasers;
Conference_Titel :
Particle Accelerator Conference, 2001. PAC 2001. Proceedings of the 2001
Conference_Location :
Chicago, IL
Print_ISBN :
0-7803-7191-7
DOI :
10.1109/PAC.2001.987596
