DocumentCode
3779740
Title
Unified model for electric fields in LDD-type MOSFETs
Author
M. Orlowski;Ch. Werner;W. Weber;H.-P. M?hlhoff;P. Murkin
Author_Institution
Siamans AG, Corporate Research and Devalopment, Microelectronics, Otto Hehn Ring 6, D-8000 Munich 83, FRG
fYear
1987
fDate
5/1/1987 12:00:00 AM
Firstpage
51
Lastpage
52
Abstract
A self-consistent analytic model is proposed for the lateral and transversal fields in an LDD-type MOSFET and is compared with simulations and experiments. The relevant formulae are based on a 2-0 potential band model. An LOG MOSFET exhibits in general three lateral field peaks, one at the source, and two at the drain side. They are governed by different mechanisms and all three can cause hot carrier degradation at different biasing conditions. The model is formulated in terms of independent local parameters into which device and technology data must be translated td predict the dependence of the electric field upon various process parameters. The model allows a straightforward explanation of a variety of experimental measurements of substrate and gate currents, and degradation behavior of LDD MOSFETs.
Keywords
"Logic gates","Degradation","Semiconductor process modeling","Predictive models","Doping","Substrates","Mathematical model"
Publisher
ieee
Conference_Titel
VLSI Technology, 1987. SymVLSITech 1987. Symposium on
Print_ISBN
978-1-5090-3151-1
Type
conf
Filename
7508765
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