• DocumentCode
    3782848
  • Title

    Investigation of ion-beam modified silicon by photoacoustic method

  • Author

    D.M. Todorovic;P.M. Nikolic;J. Elazar;M. Smiljanic;A.I. Bojicic;D.G. Vasiljevic-Radovic;K.T. Radulovic

  • Author_Institution
    Center for Multidisciplinary Studies, Belgrade Univ., Serbia
  • Volume
    1
  • fYear
    2000
  • Firstpage
    247
  • Abstract
    Thermal, elastic and electronic transport properties of ion-modified silicon samples were investigated by a photoacoustic frequency transmission technique. The experimental photoacoustic data vs the modulating frequency were measured and analyzed. The experimental results show a clear influence of the process of ion-modification on the photoacoustic signal. The thermal, elastic and electronic transport parameters of ion-modified semiconductors were obtained by comparing the experimental and calculated theoretical photoacoustic signal which provide an indicator of the degree of modification.
  • Keywords
    "Silicon","Frequency","Microphones","Thermoelasticity","Plasma devices","Plasma immersion ion implantation","Plasma materials processing","Plasma waves","Semiconductor materials","Ion implantation"
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics, 2000. Proceedings. 2000 22nd International Conference on
  • Print_ISBN
    0-7803-5235-1
  • Type

    conf

  • DOI
    10.1109/ICMEL.2000.840566
  • Filename
    840566