DocumentCode
3782848
Title
Investigation of ion-beam modified silicon by photoacoustic method
Author
D.M. Todorovic;P.M. Nikolic;J. Elazar;M. Smiljanic;A.I. Bojicic;D.G. Vasiljevic-Radovic;K.T. Radulovic
Author_Institution
Center for Multidisciplinary Studies, Belgrade Univ., Serbia
Volume
1
fYear
2000
Firstpage
247
Abstract
Thermal, elastic and electronic transport properties of ion-modified silicon samples were investigated by a photoacoustic frequency transmission technique. The experimental photoacoustic data vs the modulating frequency were measured and analyzed. The experimental results show a clear influence of the process of ion-modification on the photoacoustic signal. The thermal, elastic and electronic transport parameters of ion-modified semiconductors were obtained by comparing the experimental and calculated theoretical photoacoustic signal which provide an indicator of the degree of modification.
Keywords
"Silicon","Frequency","Microphones","Thermoelasticity","Plasma devices","Plasma immersion ion implantation","Plasma materials processing","Plasma waves","Semiconductor materials","Ion implantation"
Publisher
ieee
Conference_Titel
Microelectronics, 2000. Proceedings. 2000 22nd International Conference on
Print_ISBN
0-7803-5235-1
Type
conf
DOI
10.1109/ICMEL.2000.840566
Filename
840566
Link To Document