• DocumentCode
    3783019
  • Title

    Simulation of thermal oxidation and diffusion processes by parallel PDE solver L/sub i/SS

  • Author

    W. Joppich;S. Mijalkovic

  • Author_Institution
    German Nat. Res. Center for Comput. Sci., St. Augustin, Germany
  • fYear
    1996
  • Firstpage
    89
  • Lastpage
    90
  • Abstract
    In this paper a rigorous approach to simulate thermal oxidation and diffusion phenomena is presented. Because the numerical problems will increase in future, especially when looking towards three-dimensional process simulation, special emphasis is laid upon a parallel approach which additionally uses an optimal order solution method. Based on an environment for the parallel solution of elliptic and parabolic PDEs, L/sub i/SS, such a tool was developed.
  • Keywords
    "Oxidation","Diffusion processes","Computational modeling","Thermal engineering","Computational geometry","Boron","Multigrid methods","Partial differential equations","Information technology","Scientific computing"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 1996. SISPAD 96. 1996 International Conference on
  • Print_ISBN
    0-7803-2745-4
  • Type

    conf

  • DOI
    10.1109/SISPAD.1996.865286
  • Filename
    865286