DocumentCode :
3786159
Title :
SOI active pixel detectors of ionizing radiation-technology and design development
Author :
J. Marczewski;K. Domanski;P. Grabiec;M. Grodner;B. Jaroszewicz;A. Kociubinski;K. Kucharski;D. Tomaszewski;W. Kucewicz;S. Kuta;W. Machowski;H. Niemiec;M. Sapor;M. Caccia
Author_Institution :
Inst. of Electron Technol., Warsaw, Poland
Volume :
51
Issue :
3
fYear :
2004
Firstpage :
1025
Lastpage :
1028
Abstract :
This paper concerns the development of a novel monolithic active pixel radiation sensor based on SOI technology. In this device, the sensitive volume corresponds to a high resistivity SOI "handle" wafer and the front-end CMOS electronics is integrated in the SOI device layer. Pixel test matrices have been manufactured and are under extensive characterization. The conceptual design, together with architecture and technology issues is addressed; the latest experimental results are reported.
Keywords :
"Radiation detectors","Ionizing radiation","Silicon on insulator technology","Conductivity","Substrates","CMOS technology","Testing","Active matrix technology","Manufacturing","Ionizing radiation sensors"
Journal_Title :
IEEE Transactions on Nuclear Science
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2004.829540
Filename :
1312010
Link To Document :
بازگشت