• DocumentCode
    37886
  • Title

    CMOS Compatible Fabrication Processes for the Digital Micromirror Device

  • Author

    Cuiling Gong ; Hogan, Tim

  • Author_Institution
    Dept. of Eng., Texas Christian Univ., Fort Worth, TX, USA
  • Volume
    2
  • Issue
    3
  • fYear
    2014
  • fDate
    May-14
  • Firstpage
    27
  • Lastpage
    32
  • Abstract
    DLP® technology has been widely used in the display products since it was first introduced to the world in 1996 by Texas Instruments. Projectors powered by DLP® technology range from cinema projectors that light up large movie theater screens to palm-sized “Pico” projectors. The heart of the technology is the digital micromirror device (DMD) that features an addressable array of up to 8 million microscopic mirrors. DMDs are fabricated using standard semiconductor processing equipment. However due to the unique nature of MOEMS application and digital operation of the DMDs, special CMOS-compatible fabrication processes have been developed to produce highly reflective digital micromirrors with robust operation margin and long term reliability. This paper will present an overview of the fabrication processes of the DMDs.
  • Keywords
    CMOS digital integrated circuits; microfabrication; micromirrors; CMOS compatible fabrication processes; digital micromirror device; long term reliability; operation margin; Fabrication; Fasteners; Films; Metals; Micromirrors; Resists; DLP; DMD; Microelectromechanical devices; fabrication; spatial light modulators;
  • fLanguage
    English
  • Journal_Title
    Electron Devices Society, IEEE Journal of the
  • Publisher
    ieee
  • ISSN
    2168-6734
  • Type

    jour

  • DOI
    10.1109/JEDS.2014.2309129
  • Filename
    6774433