DocumentCode :
3805979
Title :
Comment on "Short-Term Anneal of 30-MeV Electron Damage in High-Purity n-Type Silicon"
Volume :
19
Issue :
1
fYear :
1972
Firstpage :
897
Lastpage :
898
Keywords :
"Annealing","Electrons","Silicon","Conductivity","Temperature","Laboratories","Transient analysis","Potential well","Kinetic theory","Steady-state"
Journal_Title :
IEEE Transactions on Nuclear Science
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1972.4326614
Filename :
4326614
Link To Document :
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