DocumentCode :
3809015
Title :
Degradation of Bacteria by Weakly Ionized Highly Dissociated Radio-Frequency Oxygen Plasma
Author :
Zoran Vratnica;Danijela Vujosevic;Uros Cvelbar;Miran Mozetic
Author_Institution :
Plasma Lab., Joef Stefan Inst., Ljubljana
Volume :
36
Issue :
4
fYear :
2008
Firstpage :
1300
Lastpage :
1301
Abstract :
Inductively coupled oxygen plasma was used to study the degradation of Bacillus stearothermophilus. Bacteria were deposited on a silicon wafer substrate and treated by plasma for different periods. The first effect was the removal of the envelope - a protective coating that the bacteria developed during growing. After removing the envelope (capsule), slow etching of the cell wall was observed. Further treatment resulted in the gradual removal of the cell wall, and after 240 s, only ashes remained. The images of plasma interaction steps during the bacteria degradation are presented.
Keywords :
"Degradation","Microorganisms","Radio frequency","Oxygen","Plasma applications","Silicon","Protection","Coatings","Etching","Ash"
Journal_Title :
IEEE Transactions on Plasma Science
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2008.926841
Filename :
4544506
Link To Document :
بازگشت