• DocumentCode
    381769
  • Title

    Gamma radiation dosimetry using tellurium dioxide thin film structures

  • Author

    Arshak, Khalil ; Korostynska, Olga

  • Author_Institution
    Dept. of Electron. & Comput. Eng., Limerick Univ., Ireland
  • Volume
    1
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    547
  • Abstract
    Thin films of tellurium dioxide (TeO2) were investigated for γ-radiation dosimetry purposes. Samples were fabricated using thin film vapour deposition technique. Thin films of TeO2 were exposed to a 60Co γ-radiation source at a dose rate of 6 Gy/min at room temperature. Absorption spectra for TeO2 films were recorded and the values of the optical band gap and energies of the localized states for as-deposited and γ-irradiated samples were calculated. It was found that the optical band gap values were decreased as the radiation dose was increased. Samples with electrical contacts having a planar structure showed a linear increase in current values with the increase in radiation dose up to a certain dose level. The observed changes in both the optical and the electrical properties suggest that TeO2 thin film may be considered as an effective material for room temperature real time γ-radiation dosimetry.
  • Keywords
    dosimetry; energy gap; gamma-ray detection; gamma-ray spectroscopy; optical constants; radiation monitoring; tellurium compounds; vacuum deposition; vapour deposited coatings; TeO2; energy-dispersive spectroscopy; gamma radiation dosimetry; localized states; optical band gap; planar structure; radiation dose; thin film vapour deposition technique; Chemical vapor deposition; Dosimetry; Gamma rays; Optical films; Optical recording; Photonic band gap; Sputtering; Tellurium; Temperature; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Sensors, 2002. Proceedings of IEEE
  • Print_ISBN
    0-7803-7454-1
  • Type

    conf

  • DOI
    10.1109/ICSENS.2002.1037155
  • Filename
    1037155