DocumentCode
381769
Title
Gamma radiation dosimetry using tellurium dioxide thin film structures
Author
Arshak, Khalil ; Korostynska, Olga
Author_Institution
Dept. of Electron. & Comput. Eng., Limerick Univ., Ireland
Volume
1
fYear
2002
fDate
2002
Firstpage
547
Abstract
Thin films of tellurium dioxide (TeO2) were investigated for γ-radiation dosimetry purposes. Samples were fabricated using thin film vapour deposition technique. Thin films of TeO2 were exposed to a 60Co γ-radiation source at a dose rate of 6 Gy/min at room temperature. Absorption spectra for TeO2 films were recorded and the values of the optical band gap and energies of the localized states for as-deposited and γ-irradiated samples were calculated. It was found that the optical band gap values were decreased as the radiation dose was increased. Samples with electrical contacts having a planar structure showed a linear increase in current values with the increase in radiation dose up to a certain dose level. The observed changes in both the optical and the electrical properties suggest that TeO2 thin film may be considered as an effective material for room temperature real time γ-radiation dosimetry.
Keywords
dosimetry; energy gap; gamma-ray detection; gamma-ray spectroscopy; optical constants; radiation monitoring; tellurium compounds; vacuum deposition; vapour deposited coatings; TeO2; energy-dispersive spectroscopy; gamma radiation dosimetry; localized states; optical band gap; planar structure; radiation dose; thin film vapour deposition technique; Chemical vapor deposition; Dosimetry; Gamma rays; Optical films; Optical recording; Photonic band gap; Sputtering; Tellurium; Temperature; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2002. Proceedings of IEEE
Print_ISBN
0-7803-7454-1
Type
conf
DOI
10.1109/ICSENS.2002.1037155
Filename
1037155
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