DocumentCode
383335
Title
Effects of gate-to-body tunneling current on pass-transistor based PD/SOI CMOS circuits
Author
Chuang, C.T. ; Puri, R.
Author_Institution
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
fYear
2002
fDate
7-10 Oct 2002
Firstpage
121
Lastpage
122
Abstract
The gate-to-body tunneling current (Igb) in PD/SOI devices resulting from the electron tunneling from the valence band has been shown to charge/discharge the floating-body, thus changing the body voltage and VT and affecting circuit operations. The authors present a detailed study on the effect of gate-to-body tunneling current on pass-transistor-based PD/SOI CMOS circuits in a 1.2 V, 0.13 μm PD/SOI technology with Lpoly= 0.075 μm, physical tOX = 1.5 nm, tSi = 120 nm, and tBOX = 145 nm.
Keywords
CMOS integrated circuits; MOSFET; silicon-on-insulator; tunnelling; 0.13 micron; 1.2 V; body voltage; circuit operations; floating-body charging; gate-to-body tunneling current effects; layer thickness; pass-transistor-based PD/SOI CMOS circuits; single-ended LEAP circuit; valence band electron tunneling; CMOS integrated circuits; MOSFETs; Silicon on insulator technology; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, IEEE International 2002
Print_ISBN
0-7803-7439-8
Type
conf
DOI
10.1109/SOI.2002.1044444
Filename
1044444
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