• DocumentCode
    383335
  • Title

    Effects of gate-to-body tunneling current on pass-transistor based PD/SOI CMOS circuits

  • Author

    Chuang, C.T. ; Puri, R.

  • Author_Institution
    IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    2002
  • fDate
    7-10 Oct 2002
  • Firstpage
    121
  • Lastpage
    122
  • Abstract
    The gate-to-body tunneling current (Igb) in PD/SOI devices resulting from the electron tunneling from the valence band has been shown to charge/discharge the floating-body, thus changing the body voltage and VT and affecting circuit operations. The authors present a detailed study on the effect of gate-to-body tunneling current on pass-transistor-based PD/SOI CMOS circuits in a 1.2 V, 0.13 μm PD/SOI technology with Lpoly= 0.075 μm, physical tOX = 1.5 nm, tSi = 120 nm, and tBOX = 145 nm.
  • Keywords
    CMOS integrated circuits; MOSFET; silicon-on-insulator; tunnelling; 0.13 micron; 1.2 V; body voltage; circuit operations; floating-body charging; gate-to-body tunneling current effects; layer thickness; pass-transistor-based PD/SOI CMOS circuits; single-ended LEAP circuit; valence band electron tunneling; CMOS integrated circuits; MOSFETs; Silicon on insulator technology; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, IEEE International 2002
  • Print_ISBN
    0-7803-7439-8
  • Type

    conf

  • DOI
    10.1109/SOI.2002.1044444
  • Filename
    1044444