Title :
Style-conscious quadratic field classifier
Author :
Veeramachaneni, Sriharsha ; Fujisawa, Hiromichi ; Liu, Cheng-Lin ; Nagy, George
Author_Institution :
Rensselaer Polytech. Inst., Troy, NY, USA
Abstract :
When patterns occur in the form of groups generated by the same source, distinctions between sources can be exploited to improve accuracy. We present a method for exploiting such ´style´ consistency using a quadratic discriminant. We show that under reasonable assumptions on the feature and class distributions, the estimation of style parameters is simple and accurate, therefore, style constrained classification deserves further attention.
Keywords :
covariance matrices; optical character recognition; parameter estimation; pattern classification; OCR Systems; class distributions; constrained classification; covariance matrices; feature distributions; quadratic discriminant; style parameter estimation; Character recognition; Data mining; Error analysis; Feature extraction; Hidden Markov models; Laboratories; Optical character recognition software; Text recognition; Training data; Typesetting;
Conference_Titel :
Pattern Recognition, 2002. Proceedings. 16th International Conference on
Print_ISBN :
0-7695-1695-X
DOI :
10.1109/ICPR.2002.1048239