DocumentCode :
3846111
Title :
From Atomistic to Device Level Investigation of Hybrid Redox Molecular/Silicon Field-Effect Memory Devices
Author :
Tiziana Pro;Julien Buckley;Régis Barattin;Adrian Calborean;Venera Aiello;Giuseppe Nicotra;Kai Huang;Marc Gély;Guillaume Delapierre;Eric Jalaguier;Florence Duclairoir;Nicolas Chevalier;Salvatore Lombardo;Pascale Maldivi;Gérard Ghibaudo
Author_Institution :
Electronics and Information Technology Laboratory, French Atomic Energy Commission (CEA-LETI), MINATEC,Grenoble, France
Volume :
10
Issue :
2
fYear :
2011
Firstpage :
275
Lastpage :
283
Abstract :
In this paper, an extensive investigation of hybrid molecular/Si field-effect memories is presented, where redox ferrocene (Fc) molecules play the role of the memory charge storage nodes. Engineering of the organic linkers between Fc and Si is achieved by grafting Fc with different linker lengths. The study shows a clear correlation between results from atomistic computational density functional theory, electrochemical measurements (cyclic voltammetry) and electrical data obtained by a detailed study on capacitors and pseudo-MOS devices. Physical-chemical analyses (atomic force microscopy, high-resolution transmission electron microscopy, and X-ray photoelectron spectroscopy), corroborate the quality of molecular layers on devices.
Keywords :
"Silicon","Atomic measurements","Atomic force microscopy","Atomic layer deposition","Photoelectron microscopy","Transmission electron microscopy","Density functional theory","Density measurement","Electric variables measurement","Capacitors"
Journal_Title :
IEEE Transactions on Nanotechnology
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2009.2038612
Filename :
5373934
Link To Document :
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