• DocumentCode
    3846185
  • Title

    RF Performance of InAlN/GaN HFETs and MOSHFETs With $f_{T} \times L_{G}$ up to 21 $\hbox{GHz}\cdot \mu\hbox{m}$

  • Author

    Peter Kordos;Martin Mikulics;Alfred Fox;Dagmar Gregusova;Karol Cico;Jean-Francois Carlin;Nicolas Grandjean;Jozef Novak;Karol Frohlich

  • Author_Institution
    Institute of Electrical Engineering, Slovak Academy of Sciences, Bratislava, Slovakia
  • Volume
    31
  • Issue
    3
  • fYear
    2010
  • fDate
    3/1/2010 12:00:00 AM
  • Firstpage
    180
  • Lastpage
    182
  • Abstract
    The RF performance of lattice-matched InAlN/GaN heterostructure field-effect transistors (HFETs) and Al2O3/InAlN/GaN metal-oxide-semiconductor HFETs (MOSHFETs) with varied gate length was evaluated. The current gain cutoff frequency fT and the maximum oscillation frequency f max for the HFETs with 0.3-μm gate length were 54 and 58 GHz, respectively. An increase of fT to 61 GHz and off max to 70 GHz was obtained for the MOSHFETs. The HFETs and MOSHFETs with different gate length yielded an fT ? LG product of 18 and 21 GHz ? μm, respectively. These are higher values than reported yet on InAlN/GaN devices and similar to those known for AlGaN/GaN HFETs.
  • Keywords
    "Radio frequency","Gallium nitride","HEMTs","MODFETs","MOSHFETs","Aluminum gallium nitride","Cutoff frequency","FETs","Transconductance","Information technology"
  • Journal_Title
    IEEE Electron Device Letters
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2038078
  • Filename
    5398905