• DocumentCode
    3846747
  • Title

    AlGaN/GaN/AlGaN DH-HEMTs Breakdown Voltage Enhancement Using Multiple Grating Field Plates (MGFPs)

  • Author

    Eldad Bahat-Treidel;Oliver Hilt;Frank Brunner;Victor Sidorov;Joachim W?rfl;G?nther Tr?nkle

  • Author_Institution
    Ferdinand-Braun-Institut f?r H?chstfrequenztechnik (FBH), Berlin, Germany
  • Volume
    57
  • Issue
    6
  • fYear
    2010
  • fDate
    6/1/2010 12:00:00 AM
  • Firstpage
    1208
  • Lastpage
    1216
  • Abstract
    GaN-based high-electron mobility transistors with planar multiple grating field plates (MGFPs) for high-voltage operation are described. A synergy effect with additional electron channel confinement by using a heterojunction AlGaN back barrier (BB) is demonstrated. Suppression of the OFF-state subthreshold gate and drain leakage currents enables breakdown voltage enhancement over 700 V and a low ON-state resistance of 0.68 mΩ × cm2. Such devices have a minor tradeoff in ON-state resistance, lag factor, maximum oscillation frequency, and cutoff frequency. A systematic study of the MGFP design and the effect of Al composition in the BB is described. Physics-based device simulation results give insight into electric field distribution and charge carrier concentration, depending on the field plate design.
  • Keywords
    "Gallium nitride","Logic gates","DH-HEMTs","Aluminum gallium nitride","Current measurement","Leakage current"
  • Journal_Title
    IEEE Transactions on Electron Devices
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2010.2045705
  • Filename
    5446395