DocumentCode
3846747
Title
AlGaN/GaN/AlGaN DH-HEMTs Breakdown Voltage Enhancement Using Multiple Grating Field Plates (MGFPs)
Author
Eldad Bahat-Treidel;Oliver Hilt;Frank Brunner;Victor Sidorov;Joachim W?rfl;G?nther Tr?nkle
Author_Institution
Ferdinand-Braun-Institut f?r H?chstfrequenztechnik (FBH), Berlin, Germany
Volume
57
Issue
6
fYear
2010
fDate
6/1/2010 12:00:00 AM
Firstpage
1208
Lastpage
1216
Abstract
GaN-based high-electron mobility transistors with planar multiple grating field plates (MGFPs) for high-voltage operation are described. A synergy effect with additional electron channel confinement by using a heterojunction AlGaN back barrier (BB) is demonstrated. Suppression of the OFF-state subthreshold gate and drain leakage currents enables breakdown voltage enhancement over 700 V and a low ON-state resistance of 0.68 mΩ × cm2. Such devices have a minor tradeoff in ON-state resistance, lag factor, maximum oscillation frequency, and cutoff frequency. A systematic study of the MGFP design and the effect of Al composition in the BB is described. Physics-based device simulation results give insight into electric field distribution and charge carrier concentration, depending on the field plate design.
Keywords
"Gallium nitride","Logic gates","DH-HEMTs","Aluminum gallium nitride","Current measurement","Leakage current"
Journal_Title
IEEE Transactions on Electron Devices
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2010.2045705
Filename
5446395
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