Design of Ge–SiGe Quantum-Confined Stark Effect Electroabsorption Heterostructures for CMOS Compatible Photonics

We describe a combined 6 × 6 k · p and one-band effective mass modelling tool to calculate absorption spectra in Ge-SiGe multiple quantum well (MQW) heterostructures. We find good agreement with experimentally measured absorption spectra of Ge-SiGe MQW structures described previously in the literature, proving its predictive capability, and the simulation tool is used for the analysis and design of electroabsorption modulators. We employ strain-engineering in Ge-SiGe MQW systems to design structures for modulation at 1310 nm and 1550 nm.