• DocumentCode
    385801
  • Title

    Low Noise Microwave HIFET Using MOCVD

  • Author

    Takakuwa, H. ; Tanaka, K. ; Togashi, K. ; Ohke, H. ; Kanazawa, M. ; Kato, Y.

  • Volume
    86
  • Issue
    1
  • fYear
    1986
  • fDate
    31564
  • Firstpage
    99
  • Lastpage
    102
  • Abstract
    Low noise HIFET (Hetero Interface Field Effect Transistor, also known asTEGFET or HEMT) AIGaAs/GaAs heterostructure devices have been developed using Metal Organic Chemical Vapor Deposition (MOCVD). The HIFET´s with 0.5-micron long and 200-micron wide gates have shown a minimum noise figure of 0.87 dB with an associated gain of 12.5 dB at 12 GHz at room temperature. A substantial improvement in noise figure was obtained at lower temperatures (-l0°C), especially when compared to GaAs MESFET devices.
  • Keywords
    Chemical vapor deposition; FETs; Gain; Gallium arsenide; HEMTs; MOCVD; Microwave devices; Noise figure; Organic chemicals; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Millimeter-Wave Monolithic Circuits
  • Type

    conf

  • DOI
    10.1109/MCS.1986.1114487
  • Filename
    1114487