DocumentCode :
385801
Title :
Low Noise Microwave HIFET Using MOCVD
Author :
Takakuwa, H. ; Tanaka, K. ; Togashi, K. ; Ohke, H. ; Kanazawa, M. ; Kato, Y.
Volume :
86
Issue :
1
fYear :
1986
fDate :
31564
Firstpage :
99
Lastpage :
102
Abstract :
Low noise HIFET (Hetero Interface Field Effect Transistor, also known asTEGFET or HEMT) AIGaAs/GaAs heterostructure devices have been developed using Metal Organic Chemical Vapor Deposition (MOCVD). The HIFET´s with 0.5-micron long and 200-micron wide gates have shown a minimum noise figure of 0.87 dB with an associated gain of 12.5 dB at 12 GHz at room temperature. A substantial improvement in noise figure was obtained at lower temperatures (-l0°C), especially when compared to GaAs MESFET devices.
Keywords :
Chemical vapor deposition; FETs; Gain; Gallium arsenide; HEMTs; MOCVD; Microwave devices; Noise figure; Organic chemicals; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter-Wave Monolithic Circuits
Type :
conf
DOI :
10.1109/MCS.1986.1114487
Filename :
1114487
Link To Document :
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