Title :
Fabrication and evaluation of submicron-square Si wire waveguides with spot size converters
Author :
Tsuchizawa, T. ; Watanabe, T. ; Tamechika, E. ; Shoji, T. ; Yamada, K. ; Takahashi, J. ; Uchiyama, S. ; Itabashi, S. ; Morita, H.
Author_Institution :
NTT Microsystern Integration Labs., Kanagawa, Japan
Abstract :
A schematic drawing of Si wire waveguide is shown. We aim at making the Si waveguide with a 300-nm-square section in order to remove the polarization dependence. The spot size converter consists of the tapered Si wire waveguide with a tip width of 60 nm and the 3x3 μm-square polymer waveguide.
Keywords :
integrated optics; optical communication equipment; optical fabrication; optical waveguides; silicon; Si; polarization dependence; polymer waveguide; spot size converter; spot size converters; submicron-square Si wire waveguides; tapered Si wire waveguide; Circuits; Etching; Optical device fabrication; Optical losses; Optical polymers; Optical scattering; Optical waveguides; Oxidation; Propagation losses; Wire;
Conference_Titel :
Lasers and Electro-Optics Society, 2002. LEOS 2002. The 15th Annual Meeting of the IEEE
Print_ISBN :
0-7803-7500-9
DOI :
10.1109/LEOS.2002.1134040
