• DocumentCode
    3863428
  • Title

    Dielectric properties of plasma-polymerized organo-silicon films produced in microwave discharges

  • Author

    T.S. Ramu;M.R. Wertheimer;J.E. Klemberg-Sapieha

  • Author_Institution
    Department of Engineering Physics, ECOLE POLYTECHNIQUE, Box 6079, Station “
  • fYear
    1984
  • fDate
    6/1/1984 12:00:00 AM
  • Firstpage
    167
  • Lastpage
    170
  • Abstract
    We present dielectric properties of thin plasma-polymerized films of hexamethyldisiloxane (PPHMDSQ) prepared in a. large volume microwave discharge. Among other aspects, the variation with temperature (25°C to 300°C) arid frequency (10 mHz to 10 kHz) of the relative permittivity and tan δ are reported, as are measurements of dielectric breakdown strength and self-healing properties.
  • Keywords
    "Films","Temperature measurement","Dielectric breakdown","Dielectrics","Dielectric measurement","Plasmas"
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation, 1984 IEEE International Conference on
  • Print_ISBN
    978-1-5090-3124-5
  • Type

    conf

  • DOI
    10.1109/EIC.1984.7465171
  • Filename
    7465171
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3863428