Title :
Dielectric properties of plasma-polymerized organo-silicon films produced in microwave discharges
Author :
T.S. Ramu;M.R. Wertheimer;J.E. Klemberg-Sapieha
Author_Institution :
Department of Engineering Physics, ECOLE POLYTECHNIQUE, Box 6079, Station “
fDate :
6/1/1984 12:00:00 AM
Abstract :
We present dielectric properties of thin plasma-polymerized films of hexamethyldisiloxane (PPHMDSQ) prepared in a. large volume microwave discharge. Among other aspects, the variation with temperature (25°C to 300°C) arid frequency (10 mHz to 10 kHz) of the relative permittivity and tan δ are reported, as are measurements of dielectric breakdown strength and self-healing properties.
Keywords :
"Films","Temperature measurement","Dielectric breakdown","Dielectrics","Dielectric measurement","Plasmas"
Conference_Titel :
Electrical Insulation, 1984 IEEE International Conference on
Print_ISBN :
978-1-5090-3124-5
DOI :
10.1109/EIC.1984.7465171
