• DocumentCode
    386776
  • Title

    An experimental study of 1/f noise in transistors

  • Author

    Wiggins, M.

  • Author_Institution
    Martin Company, Orlando, FL, USA
  • Volume
    12
  • fYear
    1966
  • fDate
    21-25 March 1966
  • Firstpage
    102
  • Lastpage
    110
  • Abstract
    Mathematical models of thermal and shot noise characteristics of transistors are adequate for the determination of the optimum operating point and source impedance for the mid-frequency region. However, in the case of l/f noise, which occurs at low frequencies and has a spectral distribution proportional to l/f^{n} , models presently available do not describe the phenomenon sufficiently for practical design purposes. This paper describes an experimental approach to the determination of optimum operating point and source impedance for transistor circuits in applications where l/f noise predominates. Results of a number of tests which measure the noise spectrum as a function of operating point and source impedance are described. Results of such tests are presented as parametric plots of noise factor versus frequency, and conclusions are drawn as to the choice of parameters for optimum noise performance at low frequencies. A description of the special measurement techniques is included. A procedure is developed for rapid determination of the entire noise spectrum of a transistor for practical design purposes.
  • Keywords
    Bandwidth; Electrical resistance measurement; Frequency; Instruments; Low-frequency noise; Noise generators; Noise measurement; Power measurement; Testing; Thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    1958 IRE International Convention Record
  • Conference_Location
    New York, NY, USA
  • Type

    conf

  • DOI
    10.1109/IRECON.1964.1147333
  • Filename
    1147333