DocumentCode
38756
Title
Spin Torque Switching of Perpendicularly Magnetized CoFeB-Based Tunnel Junctions With High Thermal Tolerance
Author
Yamane, Keisaku ; Higo, Y. ; Uchida, Hironaga ; Nanba, Yuji ; Sasaki, Seishi ; Ohmori, Hiromitsu ; Bessho, K. ; Hosomi, Masanori
Author_Institution
Solid State Memories Dev. Dept., Sony Corp., Atsugi, Japan
Volume
49
Issue
7
fYear
2013
fDate
Jul-13
Firstpage
4335
Lastpage
4338
Abstract
In order to launch spin transfer torque-based magnetoresistive random access memory into mass production below the 40 nm technology node, high performance perpendicularly magnetized magnetic tunnel junctions (pMTJs) are crucial. One of the key issues for pMTJs is to ensure compatibility with conventional back-end-of-line (BEOL) heating process, where thermal tolerances over 350 C for standalone memory and 400 °C for embedded memory are typically required. In this work, we successfully demonstrated high thermal tolerance in CoFeB-based pMTJs with a synthetic antiferromagnet (SAF) pinned structure while keeping stray fields on the free layer low. The annealing temperature (Tanneal) dependence of spin torque switching (STS) and TMR characteristics revealed that the reduction of Ic0, the increase of Δ, and the increase of TMR ratio were achieved by elevating Tanneal from 250 °C up to 380 °C for 30 min. Thus, we attained high STS efficiency (Ic0/Δ)=0.88 (Ic0=69 μA, Δ=78), TMR ratio=120%, RA =12 Ωμm2 at Tanneal=380 °C for the pMTJs with dimensions of 44-46 nm in diameter. Moreover, by using specially tailored pMTJs with a SAF pinned structure, we achieved high thermal tolerance up to 400 °C for 30 min while keeping Ic0/Δ=1.12 (Ic0=56 μA, Δ=50), TMR ratio=150% , RA=13 Ωμm2.
Keywords
MRAM devices; antiferromagnetic materials; cobalt compounds; iron compounds; magnetic tunnelling; spin waves; tunnelling magnetoresistance; BEOL heating process; CoFeB; CoFeB-based tunnel junctions; STS; TMR characteristics; annealing temperature; back-end-of-line heating process; embedded memory; magnetoresistive random access memory; mass production; pMTJ; perpendicularly magnetized magnetic tunnel junctions; spin torque switching; synthetic antiferromagnet pinned structure; temperature 380 degC; temperature 400 degC; thermal tolerance; Annealing; Junctions; Magnetic tunneling; Perpendicular magnetic anisotropy; Switches; Tunneling magnetoresistance; Magnetoresistive random access memory (MRAM); perpendicular magnetic anisotropy (PMA); perpendicularly magnetized CoFeB; spin torque switching (STS); tunnel magnetoresistance (TMR);
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2013.2246141
Filename
6558973
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