Title :
24.7% Record Efficiency HIT Solar Cell on Thin Silicon Wafer
Author :
Taguchi, M. ; Yano, Ayumu ; Tohoda, Satoshi ; Matsuyama, Kimihide ; Nakamura, Yoshihiko ; Nishiwaki, Toshihiro ; Fujita, Kinya ; Maruyama, Eri
Author_Institution :
Solar Bus. Unit, Sanyo Electr. Co., Ltd., Kobe, Japan
Abstract :
A new record conversion efficiency of 24.7% was attained at the research level by using a heterojunction with intrinsic thin-layer structure of practical size (101.8 cm2, total area) at a 98-μm thickness. This is a world height record for any crystalline silicon-based solar cell of practical size (100 cm2 and above). Since we announced our former record of 23.7%, we have continued to reduce recombination losses at the hetero interface between a-Si and c-Si along with cutting down resistive losses by improving the silver paste with lower resistivity and optimization of the thicknesses in a-Si layers. Using a new technology that enables the formation of a-Si layer of even higher quality on the c-Si substrate, while limiting damage to the surface of the substrate, the Voc has been improved from 0.745 to 0.750 V. We also succeeded in improving the fill factor from 0.809 to 0.832.
Keywords :
amorphous semiconductors; electrical resistivity; elemental semiconductors; optimisation; semiconductor heterojunctions; silicon; solar cells; HIT solar cell; Si; a-Si layer formation; c-Si substrate; conversion efficiency; crystalline silicon-based solar cell; fill factor; heterointerface; heterojunction; intrinsic thin-layer structure; recombination losses; resistive losses; resistivity; silver paste; substrate surface; thickness optimization; thin silicon wafer; Electrodes; Heterojunctions; Photovoltaic cells; Photovoltaic systems; Silicon; Amorphous materials; heterojunction; photovoltaic (PV) cells; silicon; surface passivation;
Journal_Title :
Photovoltaics, IEEE Journal of
DOI :
10.1109/JPHOTOV.2013.2282737