DocumentCode :
391555
Title :
Non-metallurgical bonding technology with super-narrow gap for 3D stacked LSI
Author :
Umemoto, Mitsuo ; Tanida, Kazumasa ; Tomita, Yoshihiro ; Takahashi, Tatsuro ; Takahashi, Kenji
Author_Institution :
Assoc. of Super-Adv. Electron. Technol. (ASET), Tsukuba Res. Center, Ibaraki, Japan
fYear :
2002
fDate :
10-12 Dec. 2002
Firstpage :
285
Lastpage :
288
Abstract :
The chip-stacking technologies with the thin devices in hyperfine pitch realize both of the strong demands for the high-speed signal transmission and the high-density packaging. The results of the experiments on the non-metallurgical bonding and encapsulation with nonconductive particle paste (NCP) are introduced. It realizes void-free encapsulation of under 10-μm-thick gap, small warpage of 50-μm-thick chip, and ohmic contact of all of 1844 bumps in 20-μm-pitch. Additionally, it is found the flatness of chip backside is achieved sufficient level for the thin chip stacking process with hyper fine pitch interconnection.
Keywords :
encapsulation; fine-pitch technology; integrated circuit bonding; integrated circuit interconnections; integrated circuit packaging; large scale integration; ohmic contacts; 20 micron; 3D stacked LSI; encapsulation; high-density packaging; high-speed signal transmission; hyperfine pitch interconnection; nonconductive particle paste; nonmetallurgical bonding technology; ohmic contact; super-narrow gap; thin device; Bonding; Copper; Electrodes; Electronics packaging; Encapsulation; Gold; Large scale integration; Ohmic contacts; Stacking; Wiring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging Technology Conference, 2002. 4th
Print_ISBN :
0-7803-7435-5
Type :
conf
DOI :
10.1109/EPTC.2002.1185684
Filename :
1185684
Link To Document :
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