DocumentCode
392499
Title
Removal of dilute SF6 in emission gas by nonthermal plasma generated by pulsed power
Author
Minamitani, Yasvshi ; Abe, Yoshihru ; Higashiyama, Yoshio
Author_Institution
Dept. of Electr. Eng., Yamagata Univ., Japan
fYear
2002
fDate
30 June-3 July 2002
Firstpage
579
Lastpage
582
Abstract
Investigation on removal method of SF6 was carried out by using nonthermal plasma generated by pulsed power. We investigated the dependence of the discharge power and the polarity of applied pulsed voltage to the reactor on the removal rate of SF6. The discharge power is varied with discharge repetition rate or charging voltage of the capacitor. As the discharge power increases, the removal rate of SF6 is increases. The high repetition rate of pulse is more effective for removal of SF6 than the big value of charging voltage. When the same discharge energy is supplied to the sample gas by changing the residence time or repetition rate, the removal rate is high in short residence time and high repetition rate. The removal rate of SF6 for negative pulses is higher than that for positive ones. Consequently, the nonthermal plasma generated by pulsed power is effective to remove dilute SF6 gas completely.
Keywords
air pollution control; plasma applications; plasma production; pulsed power supplies; sulphur compounds; SF6; applied pulsed voltage; capacitor; charging voltage; dilute SF6 removal; discharge energy; discharge power; discharge repetition rate; high repetition rate; negative pulses; nonthermal plasma; pulsed power; removal rate; repetition rate; residence time; short residence time; Capacitors; Corona; Electrodes; Inductors; Plasma chemistry; Power generation; Pulse generation; Sulfur hexafluoride; Switches; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop. Conference Record of the Twenty-Fifth International
ISSN
1076-8467
Print_ISBN
0-7803-7540-8
Type
conf
DOI
10.1109/MODSYM.2002.1189545
Filename
1189545
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