DocumentCode :
392628
Title :
High efficiency PERT cells on n-type silicon substrates
Author :
Zhao, Jianhua ; Wang, Aihua ; Altermatt, Pietro P. ; Green, Martin A. ; Rakotoniaina, Jean P. ; Breitenstein, Otwin
Author_Institution :
Centre for Photovoltaic Eng., New South Wales Univ., Sydney, NSW, Australia
fYear :
2002
fDate :
19-24 May 2002
Firstpage :
218
Lastpage :
221
Abstract :
High minority carrier lifetimes of a few milliseconds have been demonstrated both on CZ and FZ n-type silicon substrates. It is particularly interesting that the phosphorus doped n-type CZ wafers give minority carrier lifetimes nearly as high as those from the best p-type FZ silicon materials. This gives a good potential for very high performance on n-type CZ substrates. 21.1% and 21.9% efficiencies are reported for PERT (passivated emitter, rear totally-diffused) cells fabricated on these n-type mono-crystalline CZ and FZ silicon substrates, respectively. High open-circuit voltages approaching 700 mV have been demonstrated by these cells. Unfortunately, a non-uniform emitter saturation current has caused low fill factors for these cells, which will be investigated in future research.
Keywords :
carrier lifetime; elemental semiconductors; minority carriers; phosphorus; semiconductor device measurement; silicon; solar cells; 21.1 percent; 21.9 percent; 700 mV; Si:P; efficiency; fill factors; high efficiency PERT cells; minority carrier lifetimes; n-type silicon substrates; open-circuit voltage; p-type FZ silicon materials; phosphorus doped n-type CZ wafers; Boron; Crystallization; Degradation; Etching; Passivation; Photovoltaic cells; Photovoltaic systems; Production; Silicon; Solar power generation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
ISSN :
1060-8371
Print_ISBN :
0-7803-7471-1
Type :
conf
DOI :
10.1109/PVSC.2002.1190495
Filename :
1190495
Link To Document :
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