DocumentCode :
392629
Title :
Rapid thermal processing to enhance PECVD SiN-induced hydrogenation in high-efficiency EFG silicon solar cells
Author :
Jeong, J.-W. ; Cho, Y.H. ; Rohatgi, A. ; Rosenblum, M.D. ; Bathey, B.R. ; Kalejs, J.P.
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear :
2002
fDate :
19-24 May 2002
Firstpage :
250
Lastpage :
253
Abstract :
Rapid thermal processing (RTP) is studied to improve the bulk lifetime and efficiency of EFG Si solar cells. The RTP firing of PECVD SiN on the front and screen-printed Al on the back at 750°C with a fast cooling rate is found to increase the bulk lifetime of EFG Si from 1-3 μs to ∼50 μs due to enhanced SiN-induced hydrogen passivation of defects. This increase is believed to be enhanced due to a synergistic interaction between atomic hydrogen and vacancies. For screen-printed EFG Si solar cells, RTP firing is found to be superior to a conveyor belt furnace firing, resulting in 0.4% higher average absolute cell efficiency. Rapid firing improves back surface field, contacts, and retention of hydrogen at defects. An optimized RTP firing process produces high-efficiency EFG Si solar cells with single layer SiN antireflection coating: 15% efficiency with screen-printed contacts and 15.8% efficiency with photolithography contacts.
Keywords :
antireflection coatings; carrier lifetime; cooling; crystal growth from melt; elemental semiconductors; hydrogenation; ohmic contacts; passivation; photolithography; plasma CVD; rapid thermal processing; semiconductor growth; silicon; silicon compounds; solar cells; thick films; vacancies (crystal); 1 to 50 mus; 15 percent; 15.8 percent; 750 degC; EFG Si solar cells; PECVD SiN-induced hydrogenation; RTP firing; SiN-Si:H-Al; absolute cell efficiency; atomic hydrogen; back; back surface field; bulk lifetime; contacts; defects; efficiency; enhanced SiN-induced hydrogen passivation; fast cooling rate; front; high-efficiency EFG silicon solar cells; hydrogen retention; optimized RTP firing process; photolithography contacts; rapid thermal processing; screen-printed Al; screen-printed contacts; simultaneous annealing condition; single layer SiN antireflection coating; synergistic interaction; vacancies; Belts; Coatings; Cooling; Firing; Furnaces; Hydrogen; Passivation; Photovoltaic cells; Rapid thermal processing; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
ISSN :
1060-8371
Print_ISBN :
0-7803-7471-1
Type :
conf
DOI :
10.1109/PVSC.2002.1190503
Filename :
1190503
Link To Document :
بازگشت