DocumentCode :
39310
Title :
Multiring Circular Transmission Line Model for Ultralow Contact Resistivity Extraction
Author :
Hao Yu ; Schaekers, Marc ; Schram, Tom ; Rosseel, Erik ; Martens, Koen ; Demuynck, Steven ; Horiguchi, Naoto ; Barla, Kathy ; Collaert, Nadine ; De Meyer, Kristin ; Thean, Aaron
Author_Institution :
Dept. of Electr. Eng., Katholieke Univ. Leuven, Leuven, Belgium
Volume :
36
Issue :
6
fYear :
2015
fDate :
Jun-15
Firstpage :
600
Lastpage :
602
Abstract :
Accurate determination of contact resistivities (Pc) below 1 × 10-8 Ω · cm2 is challenging. Among the frequently applied transmission line models (TLMs), circular TLM (CTLM) has a simple process flow, while refined TLM (RTLM) has a high Pc accuracy at the expense of a more complex fabrication. In this letter, we will present a novel model-multiring CTLM (MR-CTLM), which combines the advantages of a simple process and a high Pc extraction resolution. We fabricated ultralow-Pc Ti/n-Si contacts and demonstrated the capability of MR-CTLM to extract the Pc as low as 6.2 × 10-9 Ω · cm2 with high precision.
Keywords :
contact resistance; transmission line theory; MR-CTLM; RTLM; Ti-Si; contact resistivity; multiring circular transmission line model; refined TLM; ultralow contact resistivity extraction; ultralow contacts; Accuracy; Electrodes; Metals; Power transmission lines; Probes; Resistance; Silicon; Contact resistance; circular transmission line model; simulation; transmission line model;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2015.2425792
Filename :
7093127
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=39310
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