Title :
Modeling and control for rapid thermal anneal in RTP
Author :
Hosokawa, Akihiro ; Kanoh, Hideaki ; Kusuda, Tatsufumi ; Sasaki, Seihiro ; Terashima, Kozo
Author_Institution :
Dainippon Screen MTG. Co. Ltd., Kyoto, Japan
Abstract :
A wafer temperature control system is developed for Spike RTA. The nonlinear model of a halogen lamp developed in this paper does not require the filament temperature for identification. A nonlinear feedforward controller based on this model is applied to the latest rapid thermal processor, by which good tracking performance to set points and repeatability of top temperature are verified.
Keywords :
feedforward; nonlinear control systems; rapid thermal annealing; semiconductor device manufacture; temperature control; feedforward; halogen lamp; nonlinear controller; nonlinear model; rapid thermal annealing; rapid thermal processor; semiconductor device; tracking; wafer temperature control; Control systems; Feeds; Heating; Lamps; Nonlinear control systems; Rapid thermal annealing; Rapid thermal processing; Semiconductor device modeling; Temperature control; Three-term control;
Conference_Titel :
SICE 2002. Proceedings of the 41st SICE Annual Conference
Print_ISBN :
0-7803-7631-5
DOI :
10.1109/SICE.2002.1195838
