• DocumentCode
    39571
  • Title

    In Situ Investigation of Current Transport Across Pt/n-Si (100) Schottky Junction During 100 \\hbox {MeV Ni}^{+7} Ion Irradiation

  • Author

    Verma, Shalini ; Praveen, Kumsi C. ; Kumar, Tanesh ; Kanjilal, D.

  • Author_Institution
    Inter-Univ. Accel. Centre, New Delhi, India
  • Volume
    13
  • Issue
    1
  • fYear
    2013
  • fDate
    Mar-13
  • Firstpage
    98
  • Lastpage
    102
  • Abstract
    In situ current-voltage (I-V) analyses of Pt/n-Si (100) Schottky barrier (SB) diode are carried out during 100 MeV Ni+7 ion beam irradiation. The effect of MeV ion beam on the electrical parameters like ideality factor (η) and SB height (SBH) (φB) of SB diode is investigated. For lower fluences, SBH decreases from its preradiation value, but there is almost no change in SBH for ion fluences ranging from 5×1011 to 1×1013 ions/cm2. The reverse current is increased by about two orders of magnitude at the fluence of 5×1013 ions/cm2 which corresponds to an exposure of a few tens of years in low earth orbit. The radiation-induced diffusion of Schottky metal into the semiconductor and creation of trap centers at the metal-semiconductor interface are supposed to be the most plausible mechanisms for these deviations in SB diode characteristics.
  • Keywords
    Schottky barriers; Schottky diodes; diffusion; ion beam effects; nickel; platinum; semiconductor-metal boundaries; silicon; Ni+7 ion beam irradiation; Ni7+; Pt-Si; Pt/n-Si (100) Schottky barrier diode; Pt/n-Si (100) Schottky junction; SB height; Schottky metal; current transport; electrical parameters; electron volt energy 100 MeV; ideality factor; in situ current-voltage analysis; low Earth orbit; metal-semiconductor interface; preradiation value; radiation-induced diffusion; reverse current; trap centers; Educational institutions; Ion beams; Radiation effects; Schottky barriers; Schottky diodes; Silicon; Fermi-level pinning; Metal–semiconductor Schottky barrier (SB) diodes; SB height (SBH); swift heavy ion (SHI) irradiation;
  • fLanguage
    English
  • Journal_Title
    Device and Materials Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1530-4388
  • Type

    jour

  • DOI
    10.1109/TDMR.2012.2217396
  • Filename
    6296698