Riding the relational power wave to enhance the command, control & prompt reduction of monitoring wafer usage

Author

Teo, Kok Lay ; Huang, Fay ; Wang, Jiacheng

fYear

2003

fDate

30 Sept.-2 Oct. 2003

Firstpage

457

Lastpage

460

Abstract

The paper presents a method (named as the "Power" Concept) which quantifies the controlling & management of the necessary but relentingly high Monitor Wafer usages in the Wafer Fab. The objective is effective & prompt wafer usage reduction without losing the command and control of the wafers quantity & quality. This approach establishes the understanding & quantification on the impact of each well-intentioned input action taken. Quantifications are achieved by \´adding direction\´ to the Input Power(P), and thus riding and tapping on this Power(P) & not be overwhelmed by the problems of uncontrolled Power(P). Quantifiable anticipated results are the characteristics of this approach.

Keywords

integrated circuit manufacture; process monitoring; production control; quality control; input power; monitor wafer usage; relational power wave; riding; wafer quality control; wafer quantity control; Command and control systems; Costs; Frequency; Gain control; Helicopters; Monitoring; Power generation; Pulp manufacturing; Recycling; Semiconductor device manufacture;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 2003 IEEE International Symposium on

ISSN

1523-553X

Print_ISBN

0-7803-7894-6

Type

conf

DOI

10.1109/ISSM.2003.1243326

Filename

1243326