Title :
Correlation of threading screw dislocation density to GaN 2-DEG mobility
Author :
Hite, Jennifer K. ; Gaddipati, P. ; Meyer, D.J. ; Mastro, Michael A. ; Eddy, Charles R.
Author_Institution :
U.S. Naval Res. Lab., Washington, DC, USA
Abstract :
A direct correlation between local threading screw dislocation densities in an aluminium gallium nitride/gallium nitride (AlGaN/GaN) heterostructure and the mobility of electrons in the two-dimensional electron gas (2-DEG) formed at the interface of that heterostructure is presented. Threading screw dislocations are directly imaged through open areas of Hall-effect test structures using electron channelling contrast imaging. The dislocation density measured for a given test structure is correlated to the mobility of the same structure. The results show a direct, negative correlation between mobility and screw/mixed dislocation density.
Keywords :
Hall effect; III-V semiconductors; aluminium compounds; channelling; dislocation density; electron mobility; gallium compounds; high electron mobility transistors; screw dislocations; two-dimensional electron gas; wide band gap semiconductors; 2-DEG mobility; AlGaN-GaN; ECCI; HEMT; Hall effect test structures; electron channelling contrast imaging; high electron mobility transistors; threading screw dislocation density; two-dimensional electron gas;
Journal_Title :
Electronics Letters
DOI :
10.1049/el.2014.2401