Title :
High-index contrast Ge-doped silica waveguide technology: optical performance and application to ultralow-loss ring resonators
Author :
Bourdon, G. ; Alibert, G. ; Beguin, A. ; Guiot, E. ; Bellman, R.
Author_Institution :
Corning S.A., Avon, France
Abstract :
We present a 3.5% index contrast Ge-doped silica planar technology with a propagation loss ≤0.10 dB/cm. This technology was used to fabricate ring resonators with a round-trip loss of 0.03 dB and a maximum FSR of 62.7 GHz.
Keywords :
elemental semiconductors; germanium; optical fabrication; optical losses; optical planar waveguides; optical resonators; refractive index; silicon compounds; 0.03 dB; 62.7 GHz; Ge-doped silica waveguide; SiO2:Ge; fabrication; free spectral range; high-index contrast; optical performance; propagation loss; roundtrip loss; ultralow-loss ring resonators; Optical filters; Optical propagation; Optical refraction; Optical ring resonators; Optical variables control; Optical waveguides; Passive optical networks; Propagation losses; Silicon compounds; Switches;
Conference_Titel :
Optical Fiber Communications Conference, 2003. OFC 2003
Print_ISBN :
1-55752-746-6
DOI :
10.1109/OFC.2003.1248330
