X-ray patterned deposition of gold nanoparticles from solution

Author

Divan, R. ; Mancini, D.C. ; Moldovan, N. ; Assoufid, L. ; Chu, Y.S. ; Ma, Q. ; Rosenberg, R.A.

Author_Institution

Adv. Photon Source, Argonne Nat. Lab., IL, USA

Volume

1

fYear

2003

fDate

28 Sept.-2 Oct. 2003

Abstract

High-energy synchrotron radiation was used to induce the deposition of gold nanoparticles from a gold-salt solution onto a silicon dioxide surface. The nanoparticles distribution and film morphology depend on the x-ray dose. The average lateral grain size is about 100 nm. The particles exhibit a (111) preferred orientation normal to the substrate. The properties of the nanoclusters depend on the solution chemistry and deposition conditions.

Keywords

X-ray diffraction; X-ray effects; gold; grain size; liquid phase deposition; nanoparticles; texture; 100 nm; Au; SiO₂; X-ray patterned deposition; average lateral grain size; deposition conditions; film morphology; gold nanoparticles; gold-salt solution; high-energy synchrotron radiation; metallic deposition; nanoclusters; nanoparticles distribution; preferred orientation; silicon dioxide surface; solution chemistry; x-ray dose; Artificial intelligence; Atomic force microscopy; Filters; Gold; Magnetic separation; Mirrors; Nanoparticles; Silicon compounds; Synchrotron radiation; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2003. CAS 2003. International

Print_ISBN

0-7803-7821-0

Type

conf

DOI

10.1109/SMICND.2003.1251340

Filename

1251340