Title :
Soft X-ray microscopy and EUV lithography: imaging in the 20-40 nm regime
Author :
Attwood, D. ; Anderson, E. ; Chao, W. ; Denbeaux, G. ; Fischer, P. ; Goldberg, K. ; Liddle, J.A. ; Naulleau, P. ; Schneider, G. ; Goldsmith, J. ; Kubiak, G. ; Taylor, J. ; Sweeney, D.
Author_Institution :
Appl. Sci. & Technol. Graduate Group, California Univ., Berkeley, CA, USA
Abstract :
Soft X-ray microscopy for the physical and life sciences, at wavelengths from 0.6 to 4 nm, and resolved to 20 nm, and EUV lithography at 13.5 nm wavelength, with printed features to 39 nm, are reviewed.
Keywords :
X-ray optics; X-ray spectra; biomedical optical imaging; image resolution; optical microscopy; ultraviolet lithography; ultraviolet spectra; 0.6 to 4 nm; 13.5 nm; EUV lithography; imaging; optical resolution; soft X-ray microscopy; Chaos; Image resolution; Laboratories; Lighting; Lithography; Optical imaging; Optical microscopy; Optical sensors; Ultraviolet sources; X-ray imaging;
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
Print_ISBN :
0-7803-7888-1
DOI :
10.1109/LEOS.2003.1251652
