DocumentCode
399923
Title
Droplet laser plasma sources of EUV radiation
Author
Richardson, Martin
Author_Institution
Sch. of Opt., Central Florida Univ., Orlando, FL, USA
Volume
1
fYear
2003
fDate
27-28 Oct. 2003
Abstract
This paper reports on the latest developments of EUV point sources of sufficient power and longevity for EUV lithography applications. Moreover, this paper gives an overall perspective of the developments required for laser plasmas to meet the requirements of the ITRS roadmap for EUV.
Keywords
drops; plasma diagnostics; plasma production by laser; plasma sources; ultraviolet lithography; ultraviolet sources; EUV lithography; EUV radiation sources; droplet laser plasma sources; laser plasmas; Laser modes; Laser stability; Lithography; Mirrors; Plasma sources; Power lasers; Scanning electron microscopy; Spectroscopy; Tin; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
ISSN
1092-8081
Print_ISBN
0-7803-7888-1
Type
conf
DOI
10.1109/LEOS.2003.1251715
Filename
1251715
Link To Document