• DocumentCode
    400379
  • Title

    Plasmon enhancement of optical near-field of metal nanoaperture VCSEL

  • Author

    Hashizume, J. ; Koyama, Fumio

  • Author_Institution
    Microsyst. Res. Center, Tokyo Inst. of Technol., Yokohama, Japan
  • Volume
    2
  • fYear
    2003
  • fDate
    27-28 Oct. 2003
  • Firstpage
    804
  • Abstract
    In this paper, we propose a novel structure to enhance the optical near-field in metal nano-aperture VCSELs based on the excitation of localized plasmon around a metal nano-aperture. The far-field radiation power from the aperature is increased by a factor of 4 by inserting a SiO2 layer.
  • Keywords
    electromagnetic fields; nanotechnology; silicon compounds; surface emitting lasers; surface plasmons; SiO2; SiO2 layer; far-field radiation power; localized plasmon excitation; metal nanoaperture VCSEL; optical near-field; plasmon enhancement; Apertures; Gold; High speed optical techniques; Memory; Optical diffraction; Optical recording; Plasmons; Power generation; Power measurement; Vertical cavity surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
  • ISSN
    1092-8081
  • Print_ISBN
    0-7803-7888-1
  • Type

    conf

  • DOI
    10.1109/LEOS.2003.1253044
  • Filename
    1253044
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=400379