• DocumentCode
    400902
  • Title

    Refurbishment of epoxy accelerator column bushings

  • Author

    Peebles, H. ; Bishop, Steve

  • fYear
    2002
  • fDate
    27-27 Sept. 2002
  • Firstpage
    444
  • Lastpage
    447
  • Abstract
    This paper describes a new cleaning process developed for the refurbishment of the large epoxy bushings used as high voltage insulators in the source and accelerator columns of ion implant tools. The process is designed to remove arsenic compounds condensed on the internal surfaces of these bushing as well as scattered ions implanted into the near surface region of the epoxy. In order to remove the implanted ions, some epoxy resin on the surface of the bushing must also be stripped away. Lead oxide particles exposed on the surface as a result of the removal of this epoxy are extracted in the final step of the cleaning process. Data is presented characterizing the surface contamination found on a Varian E1000 accelerator column bushing from an arsenic implant tool. The morphology and composition of the internal surfaces of this bushing are compared before and after refurbishment.
  • Keywords
    arsenic; ion implantation; semiconductor doping; surface contamination; surface morphology; As implant tool; Varian E1000 accelerator column bushing; cleaning process; composition; epoxy accelerator column bushings; internal surfaces; morphology; near surface region; refurbishment; scattered ions; Cleaning; Implants; Insulation; Insulators; Ion accelerators; Particle scattering; Process design; Surface contamination; Surface morphology; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
  • Conference_Location
    Taos, New Mexico, USA
  • Print_ISBN
    0-7803-7155-0
  • Type

    conf

  • DOI
    10.1109/IIT.2002.1258036
  • Filename
    1258036