DocumentCode
400902
Title
Refurbishment of epoxy accelerator column bushings
Author
Peebles, H. ; Bishop, Steve
fYear
2002
fDate
27-27 Sept. 2002
Firstpage
444
Lastpage
447
Abstract
This paper describes a new cleaning process developed for the refurbishment of the large epoxy bushings used as high voltage insulators in the source and accelerator columns of ion implant tools. The process is designed to remove arsenic compounds condensed on the internal surfaces of these bushing as well as scattered ions implanted into the near surface region of the epoxy. In order to remove the implanted ions, some epoxy resin on the surface of the bushing must also be stripped away. Lead oxide particles exposed on the surface as a result of the removal of this epoxy are extracted in the final step of the cleaning process. Data is presented characterizing the surface contamination found on a Varian E1000 accelerator column bushing from an arsenic implant tool. The morphology and composition of the internal surfaces of this bushing are compared before and after refurbishment.
Keywords
arsenic; ion implantation; semiconductor doping; surface contamination; surface morphology; As implant tool; Varian E1000 accelerator column bushing; cleaning process; composition; epoxy accelerator column bushings; internal surfaces; morphology; near surface region; refurbishment; scattered ions; Cleaning; Implants; Insulation; Insulators; Ion accelerators; Particle scattering; Process design; Surface contamination; Surface morphology; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location
Taos, New Mexico, USA
Print_ISBN
0-7803-7155-0
Type
conf
DOI
10.1109/IIT.2002.1258036
Filename
1258036
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