DocumentCode :
400904
Title :
Report on in-situ antimony fluoride generation for ion implant processes
Author :
Arno, J.
fYear :
2002
fDate :
27-27 Sept. 2002
Firstpage :
452
Lastpage :
454
Abstract :
The in-situ formation of antimony fluorides in a continuous flow reactor was investigated. Molecular fluorine was delivered from a VAC™ cylinder into heated reactor packed with antimony metal. The post-reactor pressure was monitored and effluent species were measured using IR and mass spectroscopic techniques. Complete fluorine utilization was achieved when operating at temperatures greater than 160°C. The data suggests that the antimony and fluorine reaction formed antimony (III) fluoride or SbxFy clusters with boiling points greater 250°C. The report also includes recommendations for implementing this technology for ion implant applications.
Keywords :
antimony compounds; infrared spectra; ion implantation; ion sources; mass spectroscopy; semiconductor doping; 160 degC; 250 degC; IR spectroscopic techniques; SbxFy; SbFx; VAC™ cylinder; continuous flow reactor; heated reactor; in-situ formation; ion implant processes; mass spectroscopic techniques; post-reactor pressure; Assembly; Bellows; Fault location; Fluid flow; Implants; Inductors; Regulators; Safety; Testing; Valves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location :
Taos, New Mexico, USA
Print_ISBN :
0-7803-7155-0
Type :
conf
DOI :
10.1109/IIT.2002.1258038
Filename :
1258038
Link To Document :
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