DocumentCode
400911
Title
orig-research
Author
Sweeney, Joseph ; Arno, J. ; Faller, R. ; Marganski, P. ; Ramirez, Claudio ; Dunn, James
fYear
2002
fDate
27-27 Sept. 2002
Firstpage
479
Lastpage
482
Abstract
A small, zero-footprint, passive chemisorption scrubber (Novasafe) has been developed to treat the effluent from ion implanters. Extensive laboratory testing dictated a dual bed unit with a diameter of 10" and a height of 12". Evaluation in a production environment indicated that scrubber lifetime varied with implanter type. The units lasted approximately 6-9 months when servicing high current implanters, and lasted in excess of one year when servicing medium current implanters. The failure mechanism on high current implanters was due to increased pressure drop resulting from solids accumulation.
Keywords
environmental factors; ion implantation; semiconductor doping; Novasafe; dual bed unit; effluent; failure mechanism; ion implant; passive chemisorption scrubber; zero footprint dry scrubber; Boron; Chemicals; Costs; Effluents; Gases; Implants; Laboratories; Resins; Silicon; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location
Taos, New Mexico, USA
Print_ISBN
0-7803-7155-0
Type
conf
DOI
10.1109/IIT.2002.1258045
Filename
1258045
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