• DocumentCode
    400911
  • Title

    orig-research

  • Author

    Sweeney, Joseph ; Arno, J. ; Faller, R. ; Marganski, P. ; Ramirez, Claudio ; Dunn, James

  • fYear
    2002
  • fDate
    27-27 Sept. 2002
  • Firstpage
    479
  • Lastpage
    482
  • Abstract
    A small, zero-footprint, passive chemisorption scrubber (Novasafe) has been developed to treat the effluent from ion implanters. Extensive laboratory testing dictated a dual bed unit with a diameter of 10" and a height of 12". Evaluation in a production environment indicated that scrubber lifetime varied with implanter type. The units lasted approximately 6-9 months when servicing high current implanters, and lasted in excess of one year when servicing medium current implanters. The failure mechanism on high current implanters was due to increased pressure drop resulting from solids accumulation.
  • Keywords
    environmental factors; ion implantation; semiconductor doping; Novasafe; dual bed unit; effluent; failure mechanism; ion implant; passive chemisorption scrubber; zero footprint dry scrubber; Boron; Chemicals; Costs; Effluents; Gases; Implants; Laboratories; Resins; Silicon; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
  • Conference_Location
    Taos, New Mexico, USA
  • Print_ISBN
    0-7803-7155-0
  • Type

    conf

  • DOI
    10.1109/IIT.2002.1258045
  • Filename
    1258045