DocumentCode
400920
Title
Implant energy determination from time-of-flight measurement
Author
Scherer, E. ; Wenzel, K.W.
fYear
2002
fDate
27-27 Sept. 2002
Firstpage
515
Lastpage
518
Abstract
High-energy ion implanters using RF acceleration have advantages over electrostatic implementations. However, beam energy from such systems is not simply related to DC voltages as it is in electrostatic systems. Traditionally, energy control in these machines relies on beam collimation from a final energy magnet. Axcelis has developed a novel approach that calculates the energy from the time delay of pulses generated by two spatially separated beam current probes. The compact and cost-effective design is based on a precision, programmable delay line and a unique pulse correlation technique. The prototype hardware has yielded a delay resolution and repeatability of better than ±100 picoseconds. Absolute energy calibration of the system is established through a nuclear interaction measurement. This patented Time-of-Flight (TOF) methodology has demonstrated the potential for <1.0 % measurement accuracy.
Keywords
calibration; ion implantation; process control; Axcelis; DC voltages; RF acceleration; beam collimation; beam energy; delay resolution; design; electrostatic implementations; energy calibration; energy control; final energy magnet; hardware; high-energy ion implanters; implant energy determination; measurement accuracy; nuclear Interaction measurement; programmable delay line; pulse correlation technique; pulse time delay; repeatability; time-of-flight measurement; Acceleration; Collimators; Delay effects; Electrostatic measurements; Energy measurement; Implants; Magnetic separation; Pulse generation; Radio frequency; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location
Taos, New Mexico, USA
Print_ISBN
0-7803-7155-0
Type
conf
DOI
10.1109/IIT.2002.1258055
Filename
1258055
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