DocumentCode
400923
Title
Recipe generator for the VIISta platform
Author
Cucchetti, Antonella ; Gibilaro, Greg
fYear
2002
fDate
27-27 Sept. 2002
Firstpage
526
Lastpage
529
Abstract
The Varian Semiconductor VIISta platform, with four single wafer implanters, provides a unique solution that meets all process needs and ensures greater manufacturing flexibility by using the same end station, factory automation, and control system. A common control system guarantees an identical approach to recipe management so that the recipe screen in both format and functionality is the same on all four products. The recipe generator is an important aspect of recipe screen functionality. This capability allows the user to create new recipes very easily just by using few key process parameters such as dose, energy, and specie. The recipe generator is a valuable tool that, together with the common control system, enhances equipment utilization. By simplifying the recipe creation process, the recipe generator makes it easier for the VIISta platform to provide powerful backup capabilities between medium current and high current implants, and medium current and high energy implants. Furthermore, it allows anyone, not specifically trained on the machine, to generate recipes and run them successfully. In this paper, we will describe the common features of the recipe format and discuss, in detail, the functionality of the recipe screen. In addition, we will present data for success rates as well as tuning times with automatically generated recipes for the VIISta 810.
Keywords
ion implantation; semiconductor doping; Varian Semiconductor VIISta platform; control system; dose; end station; energy; equipment utilization; factory automation; manufacturing flexibility; recipe generator; recipe screen functionality; single wafer implanters; specie; Automatic control; Condition monitoring; Control systems; Implants; Manufacturing automation; Manufacturing processes; Power generation; Productivity; Semiconductor device manufacture; Standby generators;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location
Taos, New Mexico, USA
Print_ISBN
0-7803-7155-0
Type
conf
DOI
10.1109/IIT.2002.1258058
Filename
1258058
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