• DocumentCode
    400923
  • Title

    Recipe generator for the VIISta platform

  • Author

    Cucchetti, Antonella ; Gibilaro, Greg

  • fYear
    2002
  • fDate
    27-27 Sept. 2002
  • Firstpage
    526
  • Lastpage
    529
  • Abstract
    The Varian Semiconductor VIISta platform, with four single wafer implanters, provides a unique solution that meets all process needs and ensures greater manufacturing flexibility by using the same end station, factory automation, and control system. A common control system guarantees an identical approach to recipe management so that the recipe screen in both format and functionality is the same on all four products. The recipe generator is an important aspect of recipe screen functionality. This capability allows the user to create new recipes very easily just by using few key process parameters such as dose, energy, and specie. The recipe generator is a valuable tool that, together with the common control system, enhances equipment utilization. By simplifying the recipe creation process, the recipe generator makes it easier for the VIISta platform to provide powerful backup capabilities between medium current and high current implants, and medium current and high energy implants. Furthermore, it allows anyone, not specifically trained on the machine, to generate recipes and run them successfully. In this paper, we will describe the common features of the recipe format and discuss, in detail, the functionality of the recipe screen. In addition, we will present data for success rates as well as tuning times with automatically generated recipes for the VIISta 810.
  • Keywords
    ion implantation; semiconductor doping; Varian Semiconductor VIISta platform; control system; dose; end station; energy; equipment utilization; factory automation; manufacturing flexibility; recipe generator; recipe screen functionality; single wafer implanters; specie; Automatic control; Condition monitoring; Control systems; Implants; Manufacturing automation; Manufacturing processes; Power generation; Productivity; Semiconductor device manufacture; Standby generators;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
  • Conference_Location
    Taos, New Mexico, USA
  • Print_ISBN
    0-7803-7155-0
  • Type

    conf

  • DOI
    10.1109/IIT.2002.1258058
  • Filename
    1258058