• DocumentCode
    400941
  • Title

    Structural and electronic properties of Fe+ implanted Cr films

  • Author

    Heck, C. ; Chayahara, A. ; Horino, Y. ; Funahashi, R. ; Miranda, R.M.N. ; Baibich, M.N.

  • fYear
    2002
  • fDate
    27-27 Sept. 2002
  • Firstpage
    622
  • Lastpage
    624
  • Abstract
    The present work deals with magnetic immiscible metals, i.e., Fe-Cr, analyzing the effect of implantation on the structure of this system and its transport properties. We have produced Cr films that, by either deposition or ion implantation had included one or two Fe-rich legions, with subsequent annealing being performed in some cases. The resulting structure and transport properties have been analyzed.
  • Keywords
    Kondo effect; annealing; antiferromagnetic materials; chromium; discontinuous metallic thin films; electrical resistivity; ion implantation; iron; magnetic thin films; Cr:Fe; Fe-rich regions; Kondo effect; X-ray diffraction; annealing; antiferromagnetic matrix; granular films; ion implantation effect; magnetic immiscible metals; magnetic nanostructures; resistivity; segregation; transmission electron microscopy; transport properties; Argon; Chromium; Giant magnetoresistance; Inorganic materials; Iron; Magnetic films; Magnetic materials; Magnetic properties; Materials science and technology; Nanostructured materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
  • Conference_Location
    Taos, New Mexico, USA
  • Print_ISBN
    0-7803-7155-0
  • Type

    conf

  • DOI
    10.1109/IIT.2002.1258082
  • Filename
    1258082