Title :
Gas cluster ion beam processing equipment
Author :
Bachand, J. ; Freytsis, A. ; Harrington, E. ; Gwinn, M. ; Hofmeester, N. ; Hautala, J. ; Regan, K.
Abstract :
Gas cluster ion beams (GCIB) are finding many applications for surface smoothing and etching of a variety of materials including semiconductors. Epion has developed commercial processing equipment, which makes possible practical application of GCIB beams for production processes. This equipment includes automatic recipe setup and tracking. Process uniformity and repeatability has been demonstrated to be better than 1%. Charge control keeps substrate charging to less than ±6 V. Throughputs as high as 10 W/hr are achievable with 200 mm wafers.
Keywords :
beam handling equipment; focused ion beam technology; ion beam assisted deposition; ion beams; ionised cluster beam deposition; sputter etching; surface cleaning; 200 mm; 6 V; charge control; etching; gas cluster ion beam processing equipment; process uniformity; repeatability; surface smoothing; Atomic measurements; Electrons; Etching; Gases; III-V semiconductor materials; Ion beams; Nitrogen; Smoothing methods; Substrates; Temperature;
Conference_Titel :
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location :
Taos, New Mexico, USA
Print_ISBN :
0-7803-7155-0
DOI :
10.1109/IIT.2002.1258094
